OpenFieldAdvanced Electron Beam Lithography and Focused Ion Beam (FIB) Masterclass
Three-day intensive technical workshop mastering sub-10 nm electron-beam resist exposure, proximity effect correction algorithms, and dual-beam FIB-SEM nanomachining.
Application checklist & requirements
These requirements reflect published university guidelines available at the last review. Review official department guidelines before submission.
- Academic degree / Prerequisites
- Cleanroom driver license at Chalmers, KTH, or Lund cleanrooms
- English language proficiency
- Working English
- Standardized testing (GRE/GMAT)
- Not required
- Thesis / Research statement
- Pattern design file (GDSII or OASIS)
- Recommendation letters
- Not required
How much will it cost? How much funding is available?
- Financial support / stipend
- Sponsored by the Swedish Research Council (VR)
- Application fee
- 0 SEK
- Tuition / joining costs
- 0 SEK course tuition
Dates and verification
- Application deadline
- November 30, 2026
- Last source review
- 2026-10-15
Important verification note
Facts reflect official Myfab - National Infrastructure for Micro and Nanofabrication documentation reviewed 2026-10-15. Admissions, funding allocations, and eligibility thresholds are evaluated by the university.
Reviewed 2026-10-15 · Editorial standards · Report an issue